A PHOTOTROPIC CRYSTAL-GROWTH OF BETA-TA2O5 BY KRF LASER PHOTOLYSIS OF TA(OCH3)5

被引:7
作者
IMAI, Y
WATANABE, A
OSATO, K
KAMEYAMA, T
FUKUDA, K
机构
关键词
D O I
10.1246/cl.1990.177
中图分类号
O6 [化学];
学科分类号
0703 ;
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页码:177 / 180
页数:4
相关论文
共 9 条
[1]   LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF SIO2 [J].
BOYER, PK ;
ROCHE, GA ;
RITCHIE, WH ;
COLLINS, GJ .
APPLIED PHYSICS LETTERS, 1982, 40 (08) :716-719
[2]   FILM GROWTH-MECHANISM OF PHOTO-CHEMICAL VAPOR-DEPOSITION [J].
INUSHIMA, T ;
HIROSE, N ;
URATA, K ;
ITO, K ;
YAMAZAKI, S .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 47 (03) :229-236
[3]   SELECTED PROPERTIES OF PYROLYTIC TA2O5 FILMS [J].
KNAUSENBERGER, WH ;
TAUBER, RN .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (07) :927-931
[4]   DEPOSITION OF NEW PIEZOELECTRIC TA2O5 THIN-FILMS AND THEIR SURFACE ACOUSTIC-WAVE PROPERTIES [J].
NAKAGAWA, Y ;
GOMI, Y ;
OKADA, T .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (11) :5012-5017
[5]  
NISHIZAWA J, 1986, J VAC SCI TECHNOL A, V4, P706, DOI 10.1116/1.573838
[6]  
OKADA M, 1985, DENKI KAGAKU, V53, P109
[7]   WAVELENGTH DEPENDENCE OF LASER-ENHANCED OXIDATION OF SILICON [J].
SCHAFER, SA ;
LYON, SA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02) :422-425
[8]   LASER-INDUCED DEPOSITION OF ZINC-OXIDE [J].
SOLANKI, R ;
COLLINS, GJ .
APPLIED PHYSICS LETTERS, 1983, 42 (08) :662-663
[9]   PHOTO-CVD OF TANTALUM OXIDE FILM FROM PENTAMETHOXY TANTALUM FOR VLSI DYNAMIC MEMORIES [J].
YAMAGISHI, K ;
TARUI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (04) :L306-L308