学术探索
学术期刊
新闻热点
数据分析
智能评审

PLASMA CHEMICAL-VAPOR-DEPOSITION AND PROPERTIES OF HARD C3N4 THIN-FILMS

被引：129
作者：
VEPREK, S
WEIDMANN, J
GLATZ, F
机构：
[1] Institute for Chemistry of Information Recording, Technical University Munich, D-85747, Garching/Munich
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 06期
关键词：
D O I：
10.1116/1.579613
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Compact thin films of stoichiometric, amorphous C3N4 have been prepared by means of chemical transport of carbon in intense nitrogen glow discharge at relatively high deposition temperature of about 800 degrees C. Their hardness reached 2500 Vickers (kg/mm(2)). (C) 1995 American Vacuum Society.
引用
收藏
页码：2914 / 2919
页数：6
相关论文
共 51 条
  • [1] FORMATION OF CARBON NITRIDE FILMS ON SI(100) SUBSTRATES BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED VAPOR-DEPOSITION
    BOUSETTA, A
    LU, M
    BENSAOULA, A
    SCHULTZ, A
    [J]. APPLIED PHYSICS LETTERS, 1994, 65 (06) : 696 - 698
  • [2] GROWTH AND CHARACTERIZATION OF C-N THIN-FILMS
    CHEN, MY
    LIN, X
    DRAVID, VP
    CHUNG, YW
    WONG, MS
    SPROUL, WD
    [J]. SURFACE & COATINGS TECHNOLOGY, 1992, 55 (1-3) : 360 - 364
  • [3] ANALYTICAL ELECTRON-MICROSCOPY AND RAMAN-SPECTROSCOPY STUDIES OF CARBON NITRIDE THIN-FILMS
    CHEN, MY
    LI, D
    LIN, X
    DRAVID, VP
    CHUNG, YW
    WONG, MS
    SPROUL, WD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1993, 11 (03): : 521 - 524
  • [4] PROPERTIES OF CARBON NITRIDE THIN-FILMS PREPARED BY ION AND VAPOR-DEPOSITION
    CHUBACI, JFD
    SAKAI, T
    YAMAMOTO, T
    OGATA, K
    EBE, A
    FUJIMOTO, F
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 463 - 466
  • [5] PREDICTING PROPERTIES AND NEW MATERIALS
    COHEN, ML
    [J]. SOLID STATE COMMUNICATIONS, 1994, 92 (1-2) : 45 - 52
  • [6] CALCULATION OF BULK MODULI OF DIAMOND AND ZINCBLENDE SOLIDS
    COHEN, ML
    [J]. PHYSICAL REVIEW B, 1985, 32 (12): : 7988 - 7991
  • [7] REACTIVE SPUTTERING OF CARBON AND CARBIDE TARGETS IN NITROGEN
    CUOMO, JJ
    LEARY, PA
    YU, D
    REUTER, W
    FRISCH, M
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 299 - 302
  • [8] EIBEL K, 1973, Z ANAL CHEM, V264, P16
  • [9] FISCHMEISTER H, 1987, HARSTOFFSCHICHTEN VE
  • [10] FORMATION OF CARBON NITRIDE FILMS BY MEANS OF ION ASSISTED DYNAMIC MIXING (IVD) METHOD
    FUJIMOTO, F
    OGATA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (3B): : L420 - L423
123456