PLASMA CHEMICAL-VAPOR-DEPOSITION AND PROPERTIES OF HARD C3N4 THIN-FILMS

被引：129

作者：

VEPREK, S

WEIDMANN, J

GLATZ, F

机构：

[1] Institute for Chemistry of Information Recording, Technical University Munich, D-85747, Garching/Munich

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 06期

关键词：

D O I：

10.1116/1.579613

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Compact thin films of stoichiometric, amorphous C3N4 have been prepared by means of chemical transport of carbon in intense nitrogen glow discharge at relatively high deposition temperature of about 800 degrees C. Their hardness reached 2500 Vickers (kg/mm(2)). (C) 1995 American Vacuum Society.

引用

页码：2914 / 2919

页数：6

共 51 条

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