RESIDUAL-STRESSES AND CRACKING IN METAL CERAMIC SYSTEMS FOR MICROELECTRONICS PACKAGING
被引:75
作者:
HSUEH, CH
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机构:Univ of California, Berkeley, Dep of, Materials Science & Mineral, Engineering, Berkeley, CA, USA, Univ of California, Berkeley, Dep of Materials Science & Mineral Engineering, Berkeley, CA, USA
HSUEH, CH
EVANS, AG
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机构:Univ of California, Berkeley, Dep of, Materials Science & Mineral, Engineering, Berkeley, CA, USA, Univ of California, Berkeley, Dep of Materials Science & Mineral Engineering, Berkeley, CA, USA
EVANS, AG
机构:
[1] Univ of California, Berkeley, Dep of, Materials Science & Mineral, Engineering, Berkeley, CA, USA, Univ of California, Berkeley, Dep of Materials Science & Mineral Engineering, Berkeley, CA, USA
Residual stresses that develop in a metal/ceramic system due to thermal expansion mismatch were calculated for a work-hardening metal. The calculations were conducted for a cylindrical configuration, pertinent to certain microelectronics packaging systems. Experimental measurements of the stress have also been made on a Cu/cordierite ceramic system, using an indentation technique. It is shown that porosity in the metal can plastically expand and provide a mode of dilatational relaxation.