X-RAY-DAMAGE TO OPTICAL-COMPONENTS USING A LASER-PLASMA SOURCE

被引:15
作者
ELTON, RC
BILLINGS, DM
GRUN, J
YOUNG, FC
MANKA, CK
RIPIN, BH
BURRIS, HR
RESNICK, J
RIPIN, DJ
MILLARD, JR
机构
[1] RES SUPPORT INSTRUMENTS INC,ALEXANDRIA,VA 22314
[2] JAYCOR INC,VIENNA,VA 22180
[3] JAYCOR INC,SAN DIEGO,CA 92121
关键词
D O I
10.1063/1.354250
中图分类号
O59 [应用物理学];
学科分类号
摘要
X-ray damage to optical surfaces consisting of melting, fracturing, cracking, and cratering is produced, and then analyzed using interference contrast microscopy and stylus profilometery. The test samples are irradiated by 0.5-1.6 keV x rays at fluence levels up to 5.5 cal/cm2. The x rays originate from L-shell transitions in copper ions, produced when 1.25-mum-thick targets are irradiated at 1.3 kJ energy by a 1.054 mum wavelength laser. The x-ray emission is found to be nearly isotropic over 2pi sr, while the plasma mass-flow distribution is peaked along the laser axis. Hence, contamination of the test sample by target debris or plasma is greatly reduced by placing the samples off axis from the laser beam, in addition to the use of beryllium shields.
引用
收藏
页码:5432 / 5436
页数:5
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