MULTIPLE-BEAM ION-IMPLANTATION SETUP FOR LARGE-SCALE TREATMENT OF SEMICONDUCTORS

被引：7

作者：

MULLER, JC

COURCELLE, E

SALLES, D

SIFFERT, P

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 6卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(85)90663-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：394 / 398

页数：5

共 12 条

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[4]

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[5]

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[6]

COURCELLE E, UNPUB SOLAR CELLS

[7]

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[9] HYDROGEN PASSIVATION OF ELECTRICALLY ACTIVE DEFECTS IN SOLAR-CELLS MADE FROM RAD POLYCRYSTALLINE SILICON RIBBONS [J].

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[10] LOW-COST ION-IMPLANTATION INTO SILICON AND PULSED ANNEALING - APPLICATION TO THE MANUFACTURING OF SOLAR-CELLS [J].

MULLER, JC ;

SIFFERT, P .

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