RECENT DEVELOPMENTS IN METALORGANIC PRECURSORS FOR METALORGANIC CHEMICAL-VAPOR-DEPOSITION

被引：31

作者：

JONES, AC

RUSHWORTH, SA

AULD, J

机构：

[1] Epichem Limited, Wirral, Merseyside L62 3QF, Power Road, Bromborough

来源：

JOURNAL OF CRYSTAL GROWTH | 1995年 / 146卷 / 1-4期

关键词：

D O I：

10.1016/0022-0248(94)00469-2

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Volatile metalorganic compounds are finding an increasing application in the deposition of metals and semiconductors by metalorganic chemical vapour deposition (MOCVD). In this paper, the use of some new precursor systems in the growth of selected metals and alloys is reviewed with emphasis being placed on precursor chemistry in the gas phase and at the growth surface.

引用

收藏

页码：503 / 510

页数：8

相关论文

共 45 条

[1] NEW, CONVENIENT, AND STEREOSPECIFIC METHOD FOR THE DEHYDRATION OF ALCOHOLS - THERMAL-DECOMPOSITION OF MAGNESIUM, ZINC, AND ALUMINUM ALKOXIDES - MECHANISTIC STUDY [J].

ASHBY, EC ;

WILLARD, GF ;

GOEL, AB .

JOURNAL OF ORGANIC CHEMISTRY, 1979, 44 (08) :1221-1232

[2] INVESTIGATIONS INTO THE GROWTH OF ALN BY MOCVD USING TRIMETHYLSILYLAZIDE AS NITROGEN-SOURCE [J].

AULD, J ;

HOULTON, DJ ;

JONES, AC ;

RUSHWORTH, SA ;

CRITCHLOW, GW .

JOURNAL OF MATERIALS CHEMISTRY, 1994, 4 (08) :1245-1247

[3] GROWTH OF ZNO BY MOCVD USING ALKYLZINC ALKOXIDES AS SINGLE-SOURCE PRECURSORS [J].

AULD, J ;

HOULTON, DJ ;

JONES, AC ;

RUSHWORTH, SA ;

MALIK, MA ;

OBRIEN, P ;

CRITCHLOW, GW .

JOURNAL OF MATERIALS CHEMISTRY, 1994, 4 (08) :1249-1253

[4]

Baixia L., 1993, J MATER CHEM, V3, P117, DOI DOI 10.1039/JM9930300117

[5] SURFACE ORGANOMETALLIC CHEMISTRY IN THE CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS USING TRIISOBUTYLALUMINUM - BETA-HYDRIDE AND BETA-ALKYL ELIMINATION-REACTIONS OF SURFACE ALKYL INTERMEDIATES [J].

BENT, BE ;

NUZZO, RG ;

DUBOIS, LH .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1989, 111 (05) :1634-1644

[6]

BERTENYI L, 1989, ANAL CHEM, V58, P1734

[7] THE GROWTH AND CHARACTERIZATION OF AIGAAS USING DIMETHYL ALUMINUM-HYDRIDE [J].

BHAT, R ;

KOZA, MA ;

CHANG, CC ;

SCHWARZ, SA ;

HARRIS, TD .

JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :7-10

[8] VAPOR-PHASE DEPOSITION OF ALUMINUM FILM ON QUARTZ SUBSTRATE [J].

BISWAS, DR ;

GHOSH, C ;

LAYMAN, RL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (01) :234-236

[9]

BRADLEY DC, 1989, Patent No. 33144

[10]

BRIOT O, 1994, SPR MRS M SAN FRANC

← 1 2 3 4 5 →