LOW RESISTANCE ALLOYED OHMIC CONTACTS TO AL0.48IN0.52AS/N+-GA0.47IN0.53AS

被引:8
作者
CAPANI, PM [1 ]
MUKHERJEE, SD [1 ]
ZWICKNAGL, P [1 ]
BERRY, JD [1 ]
GRIEM, HT [1 ]
RATHBUN, L [1 ]
EASTMAN, LF [1 ]
机构
[1] CORNELL UNIV, NATL RES & RESOURCE FACIL SUBMICRON STRUCT, ITHACA, NY 14853 USA
关键词
D O I
10.1049/el:19840310
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:446 / 447
页数:2
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