LIFETIME OF DOMINANT RADICALS FOR THE DEPOSITION OF A-SI-H FROM SIH4 AND SI2H6 GLOW-DISCHARGES

被引：40

作者：

MATSUDA, A

KAGA, T

TANAKA, H

TANAKA, K

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3093(83)90264-8

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：687 / 690

页数：4

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