THE STAEBLER-WRONSKI EFFECT IN MICROCRYSTALLINE SILICON FILMS

被引:13
作者
LIU, HN [1 ]
XU, MD [1 ]
机构
[1] NANJING UNIV,INST SOLID STATE PHYS,NANJING,PEOPLES R CHINA
关键词
Acknowledgements - The authors wish to thank Feng Xiao mei and Ma Yah dien for sample preparation; Jin Tong zheng for ESR measurement and He Yu liang for helpful discussion. This work was supported by a fund of the Chinese Academy of Science;
D O I
10.1016/0038-1098(86)90227-9
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
7
引用
收藏
页码:601 / 603
页数:3
相关论文
共 8 条