TIN(IV) SENSITIZER FOR PHOTOSELECTIVE METAL-DEPOSITION OF COBALT AND NICKEL FROM ALKALINE BATHS

被引：17

作者：

BAYLIS, BKW ^{[1
]}

HEDGECOCK, NE ^{[1
]}

SCHLESINGER, M ^{[1
]}

机构：

[1] UNIV WINDSOR,DEPT PHYS,WINDSOR N9B 3P4,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 03期

关键词：

D O I：

10.1149/1.2133303

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：346 / 349

页数：4

共 11 条

[1] LONG-LIVED SN(IV) SENSITIZER BATHS FOR PHOTO-SELECTIVE METAL-DEPOSITION
BAYLIS, BKW
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SCHLESINGER, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (09) : 1376 - 1377
[2] TIN (4) CHLORIDE SOLUTION AS A SENSITIZER IN PHOTO-SELECTIVE METAL DEPOSITION
BAYLIS, BKW
BUSUTTIL, A
HEDGECOCK, NE
SCHLESINGER, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (03) : 348 - 351
[3] ELECTRON-MICROSCOPE STUDY OF NUCLEATION AND GROWTH OF ELECTROLESS COBALT AND NICKEL
CHOW, SL
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (12) : 1614 - +
[4] ROLE OF UV LIGHT IN INHIBITION OF ELECTROLESS DEPOSITION
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (08) : 1013 - &
[5] SOME PROPERTIES OF ELECTROLESS COBALT
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SARD, R
WEIL, R
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (06) : 586 - &
[6] ELECTROLESS DEPOSITION OF NICKEL-BORON ALLOYS - MECHANISM OF PROCESS, STRUCTURE, AND SOME PROPERTIES OF DEPOSITS
GORBUNOVA, KM
IVANOV, MV
MOISEEV, VP
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) : 613 - 618
[7] NUCLEATION REACTION ON PHOTOSENSITIVE TIO2 FILMS
KELLY, JJ
VONDELING, JK
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) : 1103 - 1107
[8] Latimer W.M., 1952, J CHEM EDUC
[9] RUTHERFORD SCATTERING STUDY OF CATALYST SYSTEMS FOR ELECTROLESS CU PLATING .2. SNCL2 SENSITIZATION AND PDCL2 ACTIVATION
MEEK, RL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (11) : 1478 - 1481
[10] ORIGIN OF PHOTOCATALYTIC DEPOSITION OF NOBLE-METALS ON TIO
MOLLERS, F
TOLLE, HJ
MEMMING, R
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (09) : 1160 - 1167

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