A LARGE ALUMINUM-ALLOY MOLECULAR-BEAM EPITAXY CHAMBER WITH AN ULTIMATE PRESSURE OF 7.5X10-12TORR

被引：10

作者：

CHEN, JR ^{[1
]}

NARUSHIMA, K ^{[1
]}

MIYAMOTO, M ^{[1
]}

ISHIMARU, H ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,OHO,IBARAKI 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572890

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2200 / 2204

页数：5

共 9 条

[1] THERMAL OUTGASSING FROM ALUMINUM-ALLOY VACUUM CHAMBERS
CHEN, JR
NARUSHIMA, K
ISHIMARU, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2188 - 2191
[2] ALL-ALUMINUM-ALLOY ULTRAHIGH-VACUUM SYSTEM FOR A LARGE-SCALE ELECTRON POSITRON COLLIDER
ISHIMARU, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 1170 - 1175
[3] KUMAGI H, 1983, VACUUM SCI ENG, P154
[4] MIYAMOTO M, 1984, 8TH P S ISIAT84, V187
[5] Narushima K., 1984, Journal of the Vacuum Society of Japan, V27, P457, DOI 10.3131/jvsj.27.457
[6] NARUSHIMA K, 1982, J VAC SOC JPN, V25, P172
[7] NARUSHIMA K, 1983, JPN J VAC SOC, V26, P353
[8] SUEMITSU M, 1984, 5TH P M UHV TECHN AC, V63
[9] MODULATING ION CURRENT PRESSURE GAUGE
WATANABE, F
HIRAMATSU, S
ISHIMARU, H
[J]. VACUUM, 1983, 33 (05) : 271 - 278