A HIGH-INTENSITY MULTISAMPLE CS SPUTTER SOURCE

被引：2

作者：

SOUTHON, JR ^{[1
]}

IYER, IS ^{[1
]}

机构：

[1] UNIV MANITOBA,DEPT PHYS,WINNIPEG R3T 2N2,MANITOBA,CANADA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 47卷 / 03期

基金：

加拿大自然科学与工程研究理事会;

关键词：

D O I：

10.1016/0168-583X(90)90761-I

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a high-intensity Cs sputter negative ion source with a very simple layout of potentials and with multisample capability. The design and present performance of the prototype source are described and possible improvements are discussed. © 1990.

引用

页码：299 / 302

页数：4

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