THERMOELECTRIC-POWER STUDIES ON 1-PERCENT EXCESS TE DOPED PB0.8SN0.2TE THIN-FILMS

被引:7
作者
DAS, VD
BAHULAYAN, C
机构
[1] Thin Film Laboratory, Department of Physics, Indian Institute of Technology, Madras, 600 036, Madras
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 2A期
关键词
THERMOELECTRIC POWER; FERMI LEVEL PINNING; PB0.8SN0.2TE; THIN FILMS;
D O I
10.1143/JJAP.34.534
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of Pb0.8Sn0.2Te of thicknesses varying between 360 Angstrom and 3400 Angstrom have been prepared by flash evaporation on cleaned glass substrates held at room temperature. Thermoelectric power (TEP) of these films has been evaluated by measuring the thermal emi developed by the integral method in the temperature range 300 K to 500 K. It has been found that TEP of all the films is positive and increases with temperature in the low temperature region and tends to saturate at high temperatures. beyond 400 K. This has been attributed to the pinning of the Fermi level at high temperatures. It was also found that these films did not show the expected linear dependence of TEP on the inverse film thickness.
引用
收藏
页码:534 / 538
页数:5
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