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APPLICATION OF SURFACE-ANALYSIS METHODS TO THE CHARACTERIZATION OF SI-WAFERS FOLLOWING VARIOUS TREATMENTS

被引：1
作者：
GRUNDNER, M
机构：
来源：
FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1984年 / 319卷 / 6-7期
关键词：
D O I：
10.1007/BF01226789
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
收藏
页码：853 / 854
页数：2
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[2]   OXYGEN-CHEMISORPTION AND OXIDE FORMATION ON SI(111) AND SI(100) SURFACES [J].
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HIMPSEL, FJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :640-645
[3]   VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES [J].
IBACH, H ;
BRUCHMANN, HD ;
WAGNER, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03) :113-124
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