THEORY OF RIPPLE TOPOGRAPHY INDUCED BY ION-BOMBARDMENT

被引:1253
作者
BRADLEY, RM [1 ]
HARPER, JME [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期
关键词
D O I
10.1116/1.575561
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2390 / 2395
页数:6
相关论文
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