ELECTRONIC-STRUCTURE OF TISI2

被引:49
作者
MATTHEISS, LF
HENSEL, JC
机构
来源
PHYSICAL REVIEW B | 1989年 / 39卷 / 11期
关键词
D O I
10.1103/PhysRevB.39.7754
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:7754 / 7759
页数:6
相关论文
共 17 条
[1]  
[Anonymous], 1967, HDB LATTICE SPACINGS
[2]   METASTABLE PHASE FORMATION IN TITANIUM-SILICON THIN-FILMS [J].
BEYERS, R ;
SINCLAIR, R .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) :5240-5245
[3]  
Cracknell A. P., 1979, KRONECKER PRODUCT TA, V1
[4]   SI-METAL INTERFACE REACTION AND BULK ELECTRONIC-STRUCTURE OF SILICIDES [J].
FRANCIOSI, A ;
WEAVER, JH .
PHYSICA B & C, 1983, 117 (MAR) :846-847
[5]   ELECTRICAL TRANSPORT AND INSITU X-RAY STUDIES OF THE FORMATION OF TISI2 THIN-FILMS ON SI [J].
HENSEL, JC ;
VANDENBERG, JM ;
UNTERWALD, FC ;
MAURY, A .
APPLIED PHYSICS LETTERS, 1987, 51 (14) :1100-1102
[6]  
HENSEL JC, 1986, MATER RES SOC S P, V54, P499
[7]  
HENSEL JC, 1987, MATER RES SOC S P, V77, P737
[8]   ELECTRONIC STRUCTURE OF HCP YTTERBIUM [J].
JEPSEN, O ;
ANDERSEN, OK .
SOLID STATE COMMUNICATIONS, 1971, 9 (20) :1763-+
[9]   NUMERICAL CALCULATION OF DENSITY OF STATES AND RELATED PROPERTIES [J].
LEHMANN, G ;
TAUT, M .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1972, 54 (02) :469-477
[10]   LINEAR AUGMENTED-PLANE-WAVE CALCULATION OF THE STRUCTURAL-PROPERTIES OF BULK CR, MO, AND W [J].
MATTHEISS, LF ;
HAMANN, DR .
PHYSICAL REVIEW B, 1986, 33 (02) :823-840