REACTIVELY SPUTTERED AIN FILMS FOR GAAS ANNEALING CAPS

[1] HANTZPERGUE JJ, 1985, VIDE, V225, P13

[2] SYNTHESIS OF COMPOUND THIN-FILMS BY DUAL ION-BEAM DEPOSITION .1. EXPERIMENTAL APPROACH [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) : 550 - 555

[3] HATA T, 1980, JPN J APPL PHYS S203, V20, P145

[4] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J]. THIN SOLID FILMS, 1977, 45 (02) : 387 - 396

[5] INGREY SJ, UNPUB

[6] KIM B, 1985, ELECTRON LETT, V21, P259

[7] MACMAHON R, 1982, J VAC SC TECHNOL, V20, P376

[8] Maissel L.I., 1970, HDB THIN FILM TECHNO, P12

[9] TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1370 - 1375

[10] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751

[1] HANTZPERGUE JJ, 1985, VIDE, V225, P13

[2] SYNTHESIS OF COMPOUND THIN-FILMS BY DUAL ION-BEAM DEPOSITION .1. EXPERIMENTAL APPROACH [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) : 550 - 555

[3] HATA T, 1980, JPN J APPL PHYS S203, V20, P145

[4] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J]. THIN SOLID FILMS, 1977, 45 (02) : 387 - 396

[5] INGREY SJ, UNPUB

[6] KIM B, 1985, ELECTRON LETT, V21, P259

[7] MACMAHON R, 1982, J VAC SC TECHNOL, V20, P376

[8] Maissel L.I., 1970, HDB THIN FILM TECHNO, P12

[9] TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1370 - 1375

[10] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751