LOCAL ATOMIC-STRUCTURE IN THIN-FILMS OF SILICON-NITRIDE AND SILICON DIIMIDE PRODUCED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

被引：292

作者：

TSU, DV

LUCOVSKY, G

MANTINI, MJ

机构：

来源：

PHYSICAL REVIEW B | 1986年 / 33卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.33.7069

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7069 / 7076

页数：8

共 25 条

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