R F PLASMA DEPOSITION OF SILICON-NITRIDE LAYERS

被引：56

作者：

HELIX, MJ

VAIDYANATHAN, KV

STREETMAN, BG

DIETRICH, HB

CHATTERJEE, PK

机构：

[1] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801

[2] NAVAL RES LAB,WASHINGTON,DC 20375

[3] TEXAS INSTRUMENTS INC,CENT RES LABS,DALLAS,TX 75222

来源：

THIN SOLID FILMS | 1978年 / 55卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90082-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：143 / 148

页数：6

相关论文

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