POTENTIAL AND STOPPING POWER INFORMATION FROM ION CHANNELING IN GE

被引：12

作者：

CULBERTSON, RJ

WITHROW, SP

BARRETT, JH

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1984年 / 2卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(84)90146-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：19 / 24

页数：6

共 17 条

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[9] OSCILLATORY CHANNELED-ION SCATTERING YIELD IN BERYLLIUM [J].

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[10] MEASUREMENTS OF THE RATIO BETWEEN PLANAR AND RANDOM STOPPING POWER FOR 80 TO 300 KEV PROTONS IN SILICON [J].

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