IMPROVED MICROSCRATCH HARDNESS OF ION-PLATED CARBON-FILM BY NITROGEN INCLUSION EVALUATED BY ATOMIC-FORCE MICROSCOPE

被引：37

作者：

MIYAKE, S ^{[1
]}

WATANABE, S ^{[1
]}

MIYAZAWA, H ^{[1
]}

MURAKAWA, M ^{[1
]}

KANEKO, R ^{[1
]}

MIYAMOTO, T ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, INTERDISCIPLINARY RES LABS, MUSASHINO, TOKYO 180, JAPAN

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 25期

关键词：

D O I：

10.1063/1.112414

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nitrogen-containing carbon films where deposited by reactive ion plating under a pure nitrogen ambient. Knoop hardness, microindentation hardness, and microscratch hardness of these films were evaluated. Indentation hardness, such as Knoop hardness and microindentation hardness, is influenced by surface roughness and substrate hardness, so the effect of nitrogen inclusion on the hardness cannot be clearly evaluated. In contrast, an atomic force microscope can clearly evaluate the effect of nitrogen inclusion on scratched wear depth. © 1994 American Institute of Physics.

引用

页码：3206 / 3208

页数：3

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