HIGH-RATE DEPOSITION OF IRON FILMS BY SPUTTERING FROM 2 FACING TARGETS

被引:26
作者
HOSHI, Y [1 ]
NAOE, M [1 ]
YAMANAKA, S [1 ]
机构
[1] TOKYO INST TECHNOL,FAC ENGN,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1143/JJAP.16.1715
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1715 / 1716
页数:2
相关论文
共 3 条
  • [1] Hosokawa N., 1973, Journal of the Vacuum Society of Japan, V16, P327, DOI 10.3131/jvsj.16.327
  • [2] TSUKADA T, 1976, CPM7659 TECHN GROUP
  • [3] APPLICATION OF HIGH-RATE EXB OR MAGNETRON SPUTTERING IN METALLIZATION OF SEMICONDUCTOR-DEVICES
    WILSON, RW
    TERRY, LE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 157 - 164