CONTROL OF PREREACTION IN THE METALORGANIC CHEMICAL VAPOR-DEPOSITION OF ZINC-BASED AND CADMIUM-BASED CHALCOGENIDES

被引:33
作者
WRIGHT, PJ [1 ]
COCKAYNE, B [1 ]
PARBROOK, PJ [1 ]
OLIVER, PE [1 ]
JONES, AC [1 ]
机构
[1] EPICHEM LTD,WIRRAL L62 3QF,MERSEYSIDE,ENGLAND
关键词
D O I
10.1016/0022-0248(91)90230-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
It is shown that pyridine, when introduced into the gas phase, is effective in controlling the prereaction between the group II alkyl precursor and the group VI hydride during the metalorganic chemical vapour deposition (MOCVD) of ZnSe. During the corresponding growth of CdSe, pyridine induces a greatly reduced effect. Possible reaction mechanisms to account for prereaction control are proposed.
引用
收藏
页码:525 / 533
页数:9
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