LASER-INDUCED FLUORESCENCE DIAGNOSTICS OF GLOW-DISCHARGES - SPATIALLY RESOLVED CONCENTRATION PROFILES

被引：26

作者：

GOTTSCHO, RA

DAVIS, GP

BURTON, RH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.572192

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：622 / 624

页数：3

共 15 条

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[12] STUDIES BY ELECTRON-CYCLOTRON RESONANCE (ECR) TECHNIQUE .8. INTERACTIONS OF LOW-ENERGY ELECTRONS WITH CHLORINE-CONTAINING MOLECULES CCL4, CHCL3, CH2CL2, CNH2N+1CL (N= 1 TO 4), C2H3CL,COCL2,NOCL,CNCL AND CL2
SCHULTES, E
CHRISTODOULIDES, AA
SCHINDLER, RN
[J]. CHEMICAL PHYSICS, 1975, 8 (03) : 354 - 365
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[14] REACTIVE ION ETCHING OF SILICON
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 410 - 413
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