POSITRON DIFFUSION IN SI

被引：69

作者：

NIELSEN, B ^{[1
]}

LYNN, KG ^{[1
]}

VEHANEN, A ^{[1
]}

SCHULTZ, PJ ^{[1
]}

机构：

[1] UNIV WESTERN ONTARIO,DEPT PHYS,LONDON N6A 3K7,ONTARIO,CANADA

来源：

PHYSICAL REVIEW B | 1985年 / 32卷 / 04期

关键词：

D O I：

10.1103/PhysRevB.32.2296

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2296 / 2301

页数：6

共 30 条

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