QUANTITATIVE SURFACE PROFILIMETRY APPLIED TO SPUTTER ION BOMBARDED SAPPHIRE

被引：8

作者：

PELLERIN, CJ ^{[1
]}

CHRISTENSEN, J ^{[1
]}

JERNER, RC ^{[1
]}

PEAVEY, JH ^{[1
]}

机构：

[1] UNIV OKLAHOMA,SCH CHEM ENGN & MAT SCI,NORMAN,OK 73069

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568571

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：496 / 500

页数：5

共 7 条

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[2] BIKERMAN JJ, 1970, PHYSICAL SURFACES, P170
[3] SURFACE PROFILE MEASUREMENTS - SURVEY OF APPLICATIONS IN AREA OF VACUUM DEPOSITION
BREITWEI.G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 101 - 105
[4] FREYBERG DW, 1974, RES DEV, V25, P41
[5] GIBRA IN, 1973, PROBABILITY STATISTI, P110
[6] SURFACE STRUCTURE IN CORUNDUM .1. ETCHING OF DISLOCATIONS
SCHEUPLEIN, R
GIBBS, P
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1960, 43 (09) : 458 - 472
[7] SCHWARTZ N, 1962, 8 T NAT VAC S, P836