INSITU MBE GROWTH OF EPITAXIAL CUO FILMS WITH A SOURCE OF ACTIVATED OXYGEN

被引:19
作者
LOCQUET, JP
机构
[1] IBM Research Division, Zurich Research Laboratory
来源
JOURNAL OF THE LESS-COMMON METALS | 1990年 / 164卷
关键词
D O I
10.1016/0022-5088(90)90226-A
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth of superconducting oxides in vacuum conditions compatible with molecular beam epitaxy is a challenge, since these materials decompose under UHV conditions and at high temperatures. For this experiment, epitaxial CuO films were grown on heated MgO(100) and Y-stabilized Zr02 (YSZ) (100) substrates in an oxygen background pressure of 6 × 10-6 Torr. Cu was evaporated from a conventional effusion cell, and the in-situ oxidation was performed with an RF plasma oxygen source. X-ray diffraction and RHEED results show that CuO grows epitaxially in the [111] direction on MgO and in the [020] direction on YSZ, although in both cases epitaxial conditions are only satisfied along one particular substrate direction. © 1990.
引用
收藏
页码:300 / 306
页数:7
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