HIGHLY CONDUCTING TRANSPARENT UNDOPED INDIUM OXIDE-FILMS DEPOSITED BELOW 100-DEGREES-C BY ACTIVATED REACTIVE EVAPORATION

被引：2

作者：

LAU, WS

FONASH, SJ

机构：

[1] Pennsylvania State Univ, University, Park, PA, USA, Pennsylvania State Univ, University Park, PA, USA

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1986年 / 15卷 / 03期

关键词：

D O I：

10.1007/BF02655324

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

9

引用

收藏

页码：117 / 123

页数：7

相关论文

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