EFFECT OF DISCHARGE CONDITIONS AND CATHODE IDENTITY ON CHARGED-PARTICLE POPULATIONS IN THE NEGATIVE GLOW REGION OF A SIMPLE DIODE GLOW-DISCHARGE

被引:31
作者
FANG, DC [1 ]
MARCUS, RK [1 ]
机构
[1] CLEMSON UNIV,HOWARD L HUNTER CHEM LABS,DEPT CHEM,CLEMSON,SC 29634
关键词
D O I
10.1016/0584-8547(91)80095-K
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Plasma properties of electron temperature, average electron energy, electron energy distribution function, and electron and positive ion number densities in the negative glow region are determined for a range of discharge conditions for various cathode identities (materials). The results show that the so-called "slow" electrons are heavily populated, with depletion of higher energy electrons, above 1.2 eV. This depletion seems to be caused by atomic excitation collisions. The results also show that the electron temperature and average electron energy are controlled mainly by "fast" electrons. The work function of the cathode plays an important role in the emission of secondary electrons but does not affect significantly the bulk plasma excitation conditions.
引用
收藏
页码:983 / 1000
页数:18
相关论文
共 35 条
[1]  
[Anonymous], 1965, ELECT PROBES
[3]   TEMPERATURE AND ELECTRON-DENSITY MEASUREMENTS IN A DC GLOW-DISCHARGE [J].
BRACKETT, JM ;
MITCHELL, JC ;
VICKERS, TJ .
APPLIED SPECTROSCOPY, 1984, 38 (02) :136-140
[4]   FUNDAMENTAL PROPERTIES CHARACTERIZING LOW-PRESSURE MICROWAVE-INDUCED PLASMAS AS EXCITATION SOURCES FOR SPECTROANALYTICAL CHEMISTRY [J].
BUSCH, KW ;
VICKERS, TJ .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1973, B 28 (03) :85-104
[5]  
Chapman B., 1980, GLOW DISCHARGE PROCE
[6]  
CHEN FF, 1985, IPPJ750 RES REP
[7]   THE USE OF LANGMUIR PROBES AND OPTICAL-EMISSION SPECTROSCOPY TO MEASURE ELECTRON-ENERGY DISTRIBUTION-FUNCTIONS IN RF-GENERATED ARGON PLASMAS [J].
COX, TI ;
DESHMUKH, VGI ;
HOPE, DAO ;
HYDES, AJ ;
BRAITHWAITE, NS ;
BENJAMIN, NMP .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1987, 20 (07) :820-831
[8]   RADIO-FREQUENCY POWERED GLOW-DISCHARGE ATOMIZATION IONIZATION SOURCE FOR SOLIDS MASS-SPECTROMETRY [J].
DUCKWORTH, DC ;
MARCUS, RK .
ANALYTICAL CHEMISTRY, 1989, 61 (17) :1879-1886
[9]  
DUCKWORTH DC, 1989, 16TH ANN M FED AN CH
[10]   MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS [J].
ESER, E ;
OGILVIE, RE ;
TAYLOR, KA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :199-202