SCHOTTKY-BARRIER FORMATION AT PD/SI(111) AND V/SI(111) INTERFACES

被引：19

作者：

PURTELL, R

CLABES, JG

RUBLOFF, GW

HO, PS

REIHL, B

HIMPSEL, FJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期

关键词：

D O I：

10.1116/1.571797

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：615 / 616

页数：2

共 19 条

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