MAGNETOSTRICTION AND INSITU MEASUREMENT OF STRESS OF CO/PD COMPOSITIONALLY MODULATED MULTILAYER FILMS DURING FABRICATION

The internal stress (O‘int) at the interface of each layer of Co/Pd compositionally modulated multilayer film (CMF) was successfully measured for evaluating stress-induced anisotropy. The eMF was prepared by vacuum evaporation, and the in-situ measurement of O'int has been done during fabrication. It was clarified that Co layer was subjected to constant large tensile stress from Pd layer. This stress was much smaller than that estimated by the lattice mismatch between Co and Pd. It was also found that Pd layer evaporated on Co layer was subjected to compressive stress, however it was extending over only one or two monolayers, and then it changed to tensile one again. For the sputtered films, the magnetostriction constants were measured, and the relationship between perpendicular magnetic anisotropy and stress-induced anisotropy was discussed. © 1990 IEEE