LASER-CONTROLLED WET CHEMICAL ETCHING FOR CORRECTIVE TRIMMING OF THIN-FILMS - APPLICATION TO ALUMINUM

被引：5

作者：

TSAO, JY ^{[1
]}

EHRLICH, DJ ^{[1
]}

机构：

[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 11期

关键词：

D O I：

10.1149/1.2108382

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2244 / 2248

页数：5

共 18 条

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[5]

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[7]

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[9]

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[10] UV LASER-GENERATED FLUORINE ATOM ETCHING OF POLYCRYSTALLINE SI, MO, AND TI [J].

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TABAT, MD .

APPLIED PHYSICS LETTERS, 1985, 46 (07) :654-656

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