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RHEED OBSERVATIONS OF DISORDER ON SI(001)-(2X1) SURFACES
被引:21
作者
:
NORTON, NG
论文数:
0
引用数:
0
h-index:
0
机构:
Physics Department, Imperial College, London,SW7 2BZ, United Kingdom
NORTON, NG
机构
:
[1]
Physics Department, Imperial College, London,SW7 2BZ, United Kingdom
来源
:
VACUUM
|
1983年
/ 33卷
/ 10-1期
关键词
:
I would like to thank British Telecom for the silicon wafers;
Drs P J Dobson and B A Joyce for many helpful discussions and the Science and Engineering Research Council for a Research Studentship;
D O I
:
10.1016/0042-207X(83)90583-3
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:621 / 624
页数:4
相关论文
共 17 条
[1]
CARDILLO MJ, 1978, PHYS REV LETT, V40, P1140
[2]
ATOMIC AND ELECTRONIC-STRUCTURES OF RECONSTRUCTED SI(100) SURFACES
CHADI, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
Xerox Palo Alto Research Center, Palo Alto
CHADI, DJ
[J].
PHYSICAL REVIEW LETTERS,
1979,
43
(01)
: 43
-
47
[3]
DAWERITZ L, 1980, SURF SCI, V99, pL419, DOI 10.1016/0039-6028(80)90546-4
[4]
DIFFUSE-SCATTERING IN RHEED INDUCED BY LINEAR DISORDERS OF SULFUR SEGRATED ON NICKEL (111) SURFACE
DELESCLUSE, P
论文数:
0
引用数:
0
h-index:
0
DELESCLUSE, P
MASSON, A
论文数:
0
引用数:
0
h-index:
0
MASSON, A
[J].
SURFACE SCIENCE,
1980,
100
(02)
: 423
-
438
[5]
DOBSON PJ, 1982, SURF SCI, V119, pL339, DOI 10.1016/0039-6028(82)90177-7
[6]
INTERPRETATION OF SCANNING HIGH-ENERGY ELECTRON-DIFFRACTION MEASUREMENTS WITH APPLICATION TO GAAS SURFACES
DOVE, DB
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DOVE, DB
LUDEKE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LUDEKE, R
CHANG, LL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CHANG, LL
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(04)
: 1897
-
1899
[7]
STRUCTURAL AND ELECTRONIC PROPERTIES OF STEPPED SEMICONDUCTOR SURFACES
HENZLER, M
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
HENZLER, M
CLABES, J
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
CLABES, J
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1974,
: 389
-
396
[8]
COMPARATIVE LEED AND RHEED EXAMINATION OF STEPPED SURFACES - APPLICATION TO CU(111) AND GAAS(001) VICINAL SURFACES
HOTTIER, F
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
HOTTIER, F
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
THEETEN, JB
MASSON, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
MASSON, A
DOMANGE, JL
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
DOMANGE, JL
[J].
SURFACE SCIENCE,
1977,
65
(02)
: 563
-
577
[9]
DOUBLE DIFFRACTION SPOTS IN RHEED PATTERNS FROM CLEAN GE(111) AND SI(001) SURFACES
ICHIKAWA, T
论文数:
0
引用数:
0
h-index:
0
机构:
The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai
ICHIKAWA, T
INO, S
论文数:
0
引用数:
0
h-index:
0
机构:
The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai
INO, S
[J].
SURFACE SCIENCE,
1979,
85
(02)
: 221
-
243
[10]
SOME ASPECTS OF SURFACE BEHAVIOR OF SILICON
JOYCE, BA
论文数:
0
引用数:
0
h-index:
0
机构:
MULLARD RES LABS,REDHILL,SURREY,ENGLAND
MULLARD RES LABS,REDHILL,SURREY,ENGLAND
JOYCE, BA
[J].
SURFACE SCIENCE,
1973,
35
(01)
: 1
-
7
←
1
2
→
共 17 条
[1]
CARDILLO MJ, 1978, PHYS REV LETT, V40, P1140
[2]
ATOMIC AND ELECTRONIC-STRUCTURES OF RECONSTRUCTED SI(100) SURFACES
CHADI, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
Xerox Palo Alto Research Center, Palo Alto
CHADI, DJ
[J].
PHYSICAL REVIEW LETTERS,
1979,
43
(01)
: 43
-
47
[3]
DAWERITZ L, 1980, SURF SCI, V99, pL419, DOI 10.1016/0039-6028(80)90546-4
[4]
DIFFUSE-SCATTERING IN RHEED INDUCED BY LINEAR DISORDERS OF SULFUR SEGRATED ON NICKEL (111) SURFACE
DELESCLUSE, P
论文数:
0
引用数:
0
h-index:
0
DELESCLUSE, P
MASSON, A
论文数:
0
引用数:
0
h-index:
0
MASSON, A
[J].
SURFACE SCIENCE,
1980,
100
(02)
: 423
-
438
[5]
DOBSON PJ, 1982, SURF SCI, V119, pL339, DOI 10.1016/0039-6028(82)90177-7
[6]
INTERPRETATION OF SCANNING HIGH-ENERGY ELECTRON-DIFFRACTION MEASUREMENTS WITH APPLICATION TO GAAS SURFACES
DOVE, DB
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
DOVE, DB
LUDEKE, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LUDEKE, R
CHANG, LL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
CHANG, LL
[J].
JOURNAL OF APPLIED PHYSICS,
1973,
44
(04)
: 1897
-
1899
[7]
STRUCTURAL AND ELECTRONIC PROPERTIES OF STEPPED SEMICONDUCTOR SURFACES
HENZLER, M
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
HENZLER, M
CLABES, J
论文数:
0
引用数:
0
h-index:
0
机构:
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
TECH UNIV CLAUSTHAL, PHYS INST, CLAUSTHAL, FED REP GER
CLABES, J
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1974,
: 389
-
396
[8]
COMPARATIVE LEED AND RHEED EXAMINATION OF STEPPED SURFACES - APPLICATION TO CU(111) AND GAAS(001) VICINAL SURFACES
HOTTIER, F
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
HOTTIER, F
THEETEN, JB
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
THEETEN, JB
MASSON, A
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
MASSON, A
DOMANGE, JL
论文数:
0
引用数:
0
h-index:
0
机构:
LAB ELECTR & PHYS APPL 3, F-94450 LIMEIL BREVANNES, FRANCE
DOMANGE, JL
[J].
SURFACE SCIENCE,
1977,
65
(02)
: 563
-
577
[9]
DOUBLE DIFFRACTION SPOTS IN RHEED PATTERNS FROM CLEAN GE(111) AND SI(001) SURFACES
ICHIKAWA, T
论文数:
0
引用数:
0
h-index:
0
机构:
The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai
ICHIKAWA, T
INO, S
论文数:
0
引用数:
0
h-index:
0
机构:
The Research Institute for Iron, Steel and Other Metals, Tohoku University, Sendai
INO, S
[J].
SURFACE SCIENCE,
1979,
85
(02)
: 221
-
243
[10]
SOME ASPECTS OF SURFACE BEHAVIOR OF SILICON
JOYCE, BA
论文数:
0
引用数:
0
h-index:
0
机构:
MULLARD RES LABS,REDHILL,SURREY,ENGLAND
MULLARD RES LABS,REDHILL,SURREY,ENGLAND
JOYCE, BA
[J].
SURFACE SCIENCE,
1973,
35
(01)
: 1
-
7
←
1
2
→