DIRECT-CURRENT HOLLOW-CATHODE GLOW-DISCHARGE PLASMA-ENHANCED-CHEMICAL-VAPOUR-DEPOSITION TECHNIQUE FOR A SI-H THIN-FILM PRODUCTION

被引:6
作者
MATSUMURA, S
SAKURAI, K
BEREZIN, AA
HOBSON, RM
TEII, S
CHANG, JS
机构
[1] YORK UNIV,DEPT PHYS,DOWNSVIEW M3J 1P3,ONTARIO,CANADA
[2] MUSASHI INST TECHNOL,DEPT ELECT ENGN,TOKYO 158,JAPAN
关键词
D O I
10.1139/p85-133
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:826 / 830
页数:5
相关论文
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