CHEMICAL HAZARDS IN THE SEMICONDUCTOR INDUSTRY

被引：30

作者：

CHELTON, CF ^{[1
]}

GLOWATZ, M ^{[1
]}

MOSOVSKY, JA ^{[1
]}

机构：

[1] AT&T BELL LABS,CTR SOLID STATE TECHNOL,BREINIGSVILLE,PA 18031

来源：

IEEE TRANSACTIONS ON EDUCATION | 1991年 / 34卷 / 03期

关键词：

D O I：

10.1109/13.85086

中图分类号：

G40 [教育学];

学科分类号：

040101 ; 120403 ;

摘要：

The operations of high-tech semiconductor manufacturing and R&D operations presents a myriad of potential industrial hygiene and safety hazards and problems. Chemical hazards in the semiconductor industry are reviewed in an industrial hygiene format. Exposure potentials are summarized for each step in the development and processing of semiconductor devices. The hazards associated with replacement substitutes for III-V compounds are also presented. Risk assessment of the hazards involved in these processes requires that redundant control technology be employed. Controls in semiconductor research and development are reviewed including limiting orifices on compressed gas cylinders, ventilated gas cabinet for storage of compressed gases, dedicated exhaust risers, exhaust flow sensors, multipoint gas monitoring systems, interlocked devices for exhaust and power failure, smoke and fire detection, and fire suppression.

引用

页码：269 / 288

页数：20

共 80 条

[41] ASSESSMENT OF THE DEVELOPMENTAL RISKS RESULTING FROM OCCUPATIONAL EXPOSURE TO SELECT GLYCOL ETHERS WITHIN THE SEMICONDUCTOR INDUSTRY [J].

PAUSTENBACH, DJ .

JOURNAL OF TOXICOLOGY AND ENVIRONMENTAL HEALTH, 1988, 23 (01) :29-75

[42]

RAINER D, 1986, SOLID STATE TECH JUL, P63

[43]

RHOADES B, 1989, APP IND HYGIENE, V4, P105

[44]

Sax N.I., 1984, DANGEROUS PROPERTIES

[45]

STEWART JH, 1985, IND HYGIENE ASPECTS, V3, P439

[46]

STRANG C, 1987, SOLID STATE TECH APR, P69

[47]

TAYLOR P, 1987, SEMICONDUCT SAFE JAN, P57

[48]

VARADI L, 1988, APR SSA INT HIGH TEC

[49]

VELTRIE J, SOL CELLS, V19, P337

[50]

Wade R, 1981, SEMICONDUCTOR IND ST

← 1 2 3 4 5 6 7 8 →