THE ATTACHMENT RATE FOR THERMAL ELECTRONS TO SF6 AND CFCL3

被引：13

作者：

CROMPTON, RW

HADDAD, GN

HEGERBERG, R

ROBERTSON, AG

机构：

来源：

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS | 1982年 / 15卷 / 13期

关键词：

D O I：

10.1088/0022-3700/15/13/012

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：L483 / L484

页数：2

共 13 条

[1] LINE-SHAPES FOR ATTACHMENT OF THRESHOLD ELECTRONS TO SF6 AND CFCL3 - THRESHOLD PHOTOELECTRON (TPSA) STUDIES OF XE, CO, AND C2H2 [J].

AJELLO, JM ;

CHUTJIAN, A .

JOURNAL OF CHEMICAL PHYSICS, 1979, 71 (03) :1079-1087

[2] THERMAL ELECTRON-ATTACHMENT RATE TO CCL4, CHCL3, CH2CL2, AND SF6 [J].

AYALA, JA ;

WENTWORTH, WE ;

CHEN, ECM .

JOURNAL OF PHYSICAL CHEMISTRY, 1981, 85 (26) :3989-3994

[3] MEASUREMENT OF LATERAL DIFFUSION COEFFICIENTS AND FIRST TOWNSEND COEFFICIENTS FOR ELECTRONS IN HELIUM BY AN ELECTRON-DENSITY SAMPLING METHOD [J].

CAVALLERI, G .

PHYSICAL REVIEW, 1969, 179 (01) :186-+

[4] CROSS SECTIONS FOR ELECTRON ATTACHMENT RESONANCES PEAKING AT SUBTHERMAL ENERGIES [J].

CHRISTOP.LG ;

MCCORKLE, DL ;

CARTER, JG .

JOURNAL OF CHEMICAL PHYSICS, 1971, 54 (01) :253-&

[5]

CHUTJIAN A, 1982, PHYS REV LETT, V48, P289, DOI 10.1103/PhysRevLett.48.289

[6] EXPERIMENTAL SF6-SF6 AND CL-CFCL3 ELECTRON-ATTACHMENT CROSS-SECTIONS IN THE ENERGY-RANGE 0-200 MEV [J].

CHUTJIAN, A .

PHYSICAL REVIEW LETTERS, 1981, 46 (23) :1511-1514

[7]

CROMPTON RW, 1982, UNPUB

[8] ELECTRON ATTACHMENT TO SF6 [J].

FEHSENFE.FC .

JOURNAL OF CHEMICAL PHYSICS, 1970, 53 (05) :2000-&

[9] DIRECT OBSERVATION OF ELECTRON DISAPPEARANCE IN PULSE IRRADIATED FLUOROCARBON GASES [J].

FESSENDEN, RW ;

BANSAL, KM .

JOURNAL OF CHEMICAL PHYSICS, 1970, 53 (09) :3468-+

[10] MEASUREMENTS OF THERMAL-DIFFUSION COEFFICIENT FOR ELECTRONS IN HELIUM [J].

GIBSON, DK ;

CROMPTON, RW ;

CAVALLERI, G .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1973, 6 (06) :1118-1128

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