STRUCTURAL STUDY OF ELECTRODEPOSITED ALUMINUM-MANGANESE ALLOYS

被引:33
作者
GRUSHKO, B [1 ]
STAFFORD, GR [1 ]
机构
[1] NATL INST STANDARDS & TECHNOL,DIV MET,GAITHERSBURG,MD 20899
来源
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1989年 / 20卷 / 08期
关键词
D O I
10.1007/BF02665493
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1351 / 1359
页数:9
相关论文
共 20 条
[1]  
AUSTIN LW, 1963, ELECTROCHEM TECHNOL, V1, P269
[2]   STRUCTURE OF RAPIDLY QUENCHED AL-MN [J].
BANCEL, PA ;
HEINEY, PA ;
STEPHENS, PW ;
GOLDMAN, AI ;
HORN, PM .
PHYSICAL REVIEW LETTERS, 1985, 54 (22) :2422-2425
[3]  
BARD AJ, 1976, ENCY ELECTROCHEMISTR, V6, P88
[4]  
Bendersky L. A., 1987, Journal of Materials Research, V2, P427, DOI 10.1557/JMR.1987.0427
[5]   Nucleation behavior of Al-Mn icosahedral phase [J].
Bendersky, L. A. ;
Ridder, S. D. .
JOURNAL OF MATERIALS RESEARCH, 1986, 1 (03) :405-414
[6]  
BRENNER A, 1950, PLATING, V37, P36
[7]   FORMATION OF ICOSAHEDRAL AL-MN AND AL-RU BY SOLID-STATE PROCESSES [J].
FOLLSTAEDT, DM ;
KNAPP, JA .
MATERIALS SCIENCE AND ENGINEERING, 1987, 90 :1-8
[8]  
HALL DE, 1988, UNPUB NATIONAL I STA
[9]   SPUTTER DEPOSITION OF ICOSAHEDRAL AL-MN AND AL-MN-SI [J].
KREIDER, KG ;
BIANCANIELLO, FS ;
KAUFMAN, MJ .
SCRIPTA METALLURGICA, 1987, 21 (05) :657-662
[10]   GROWTH AND STRUCTURE OF ELECTRODEPOSITED THIN METAL FILMS [J].
LAWLESS, KR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (01) :24-&