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ALUMINUM ALUMINUM-NITRIDE SPUTTER DEPOSITION ON THE INERTIAL FUSION TARGET USING THE PULSED-GAS PROCESS

被引：3
作者：
NOYES, SG
KIM, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.573106
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1201 / 1203
页数：3
相关论文
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