INTERFACE SHAPE STUDIES FOR SILICON RIBBON GROWTH BY THE EFG TECHNIQUE .1. TRANSPORT PHENOMENA MODELING

被引:31
作者
KALEJS, JP [1 ]
CHIN, LY [1 ]
CARLSON, FM [1 ]
机构
[1] CLARKSON COLL TECHNOL,DEPT CHEM ENGN,POTSDAM,NY 13676
关键词
D O I
10.1016/0022-0248(83)90176-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:473 / 484
页数:12
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