DEPOSITION OF AG ON SI(100) SURFACES AS STUDIED BY LEED-AES

被引：26

作者：

HANAWA, T ^{[1
]}

OURA, K ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN,ELECTRON BEAM LAB,SUITA,OSAKA 565,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 03期

关键词：

D O I：

10.1143/JJAP.16.519

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：519 / 520

页数：2

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