A ONE-DIMENSIONAL COLLISIONAL MODEL FOR PLASMA-IMMERSION ION-IMPLANTATION

被引：68

作者：

VAHEDI, V

LIEBERMAN, MA

ALVES, MV

VERBONCOEUR, JP

BIRDSALL, CK

机构：

[1] Plasma Theory and Simulation Group, University of California, Berkeley

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 69卷 / 04期

关键词：

D O I：

10.1063/1.348774

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma-immersion ion implantation (also known as plasma-source ion implantation) is a process in which a target is immersed in a plasma and a series of large negative-voltage pulses are applied to it to extract ions from the plasma and implant them into the target. A general one-dimensional model is developed to study this process in different coordinate systems for the case in which the pressure of the neutral gas is large enough that the ion motion in the sheath can be assumed to be highly collisional.

引用

页码：2008 / 2014

页数：7

共 12 条

[1]

ALVES MV, 1989, B AM PHYS SOC, V34, P2028

[2]

BIRDSALL CK, 1985, PLASMA PHYSICS VIA C

[3] SHEATH THICKNESS AND POTENTIAL PROFILES OF ION-MATRIX SHEATHS FOR CYLINDRICAL AND SPHERICAL ELECTRODES [J].