WAFER FAULT MEASUREMENT BY COHERENT OPTICAL PROCESSOR

被引：7

作者：

CAI, XY

KVASNIK, F

BLORE, RW

机构：

[1] Department of Instrumentation and Analytical Scienc, University of Manchester Institute of Science and Technology, MA

来源：

APPLIED OPTICS | 1994年 / 33卷 / 20期

关键词：

MICROSCOPE COHERENT OPTICAL PROCESSOR; WAFER; INSPECTION; REGISTRATION; COHERENT OPTICAL PROCESSOR; PROCESS MONITORING; QUALITY CONTROL;

D O I：

10.1364/AO.33.004487

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A microscope coherent optical processor based on the VanderLugt optical correlator is applied to the measurement of registration error in multilayer integrated-circuit wafers. A treatment of the effects of wafer faults on the correlation signal is given. Threshold criteria and fault-induced peak splitting of the correlation signal from reject production samples are exploited to demonstrate the easy and rapid detection of faults in partially processed integrated-circuit wafers.

引用

页码：4487 / 4496

页数：10

共 13 条

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