ANOMALOUS 1ST-PHASE FORMATION IN RAPIDLY THERMAL ANNEALED, THIN-LAYERED SI NI SI FILMS

被引：20

作者：

NATAN, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 05期

关键词：

D O I：

10.1063/1.97188

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：257 / 259

页数：3

共 14 条

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[4]

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MAJNI, G ;

COSTATO, M ;

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[6]

NATAN M, 1986, THIN FILMS INTERFACE, V54, P115

[7]

NATAN MJ, UNPUB

[8]

NICOLET MA, 1983, VLSI ELECTRONICS MIC, V6, P458

[9] FORMATION OF AN AMORPHOUS ALLOY BY SOLID-STATE REACTION OF THE PURE POLYCRYSTALLINE METALS [J].

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[10]

VONALLMEN M, 1980, THIN FILM INTERFACES, V80, P364

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