CHEMICAL-REACTIONS AT PT/OXIDE/SI AND TI/OXIDE/SI INTERFACES

被引：49

作者：

LIEHR, M

LEGOUES, FK

RUBLOFF, GW

HO, PS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573371

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：983 / 986

页数：4

共 22 条

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