THEORY OF OPTICAL INTERBAND-TRANSITIONS IN STRAINED SI1-YCY GROWN PSEUDOMORPHICALLY ON SI(001)

被引:14
作者
ZOLLNER, S [1 ]
机构
[1] IOWA STATE UNIV SCI & TECHNOL,DEPT PHYS & ASTRON,AMES,IA 50011
关键词
D O I
10.1063/1.359696
中图分类号
O59 [应用物理学];
学科分类号
摘要
Recently W. Kissinger, M. Weidner, H. J. Osten, and M. Eichler [Appl. Phys. Lett. 65, 3356 (1994)] reported ellipsometry and electroreflectance measurements on the E(0)', E(1), and E(2) critical point energies in strained Si1-yCy alloys grown pseudomorphically on Si (001) using molecular-beam epitaxy. We present a theory explaining these energies using established deformation-potential theory and interpret the results and their implications for the band structure of these alloys. (C) 1995 American Institute of Physics.
引用
收藏
页码:5209 / 5211
页数:3
相关论文
共 21 条
[1]   CALCULATED OPTICAL-PROPERTIES OF SEMICONDUCTORS [J].
ALOUANI, M ;
BREY, L ;
CHRISTENSEN, NE .
PHYSICAL REVIEW B, 1988, 37 (03) :1167-1179
[3]   IS THERE AN ELASTIC ANOMALY FOR A (001) MONOLAYER OF INAS EMBEDDED IN GAAS [J].
BERNARD, JE ;
ZUNGER, A .
APPLIED PHYSICS LETTERS, 1994, 65 (02) :165-167
[4]   ELECTROREFLECTANCE AND ELLIPSOMETRY OF SILICON FROM 3 TO 6 EV [J].
DAUNOIS, A ;
ASPNES, DE .
PHYSICAL REVIEW B, 1978, 18 (04) :1824-1839
[5]   THEORETICAL INVESTIGATION OF RANDOM SI-C ALLOYS [J].
DEMKOV, AA ;
SANKEY, OF .
PHYSICAL REVIEW B, 1993, 48 (04) :2207-2214
[6]   GROWTH AND STRAIN COMPENSATION EFFECTS IN THE TERNARY SI1-X-YGEXCY ALLOY SYSTEM [J].
EBERL, K ;
IYER, SS ;
ZOLLNER, S ;
TSANG, JC ;
LEGOUES, FK .
APPLIED PHYSICS LETTERS, 1992, 60 (24) :3033-3035
[7]   ELASTO-OPTICAL CONSTANTS OF SI [J].
ETCHEGOIN, P ;
KIRCHER, J ;
CARDONA, M .
PHYSICAL REVIEW B, 1993, 47 (16) :10292-10303
[8]   OPTICAL-SPECTRA OF SIXGE1-X ALLOYS [J].
HUMLICEK, J ;
GARRIGA, M ;
ALONSO, MI ;
CARDONA, M .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (07) :2827-2832
[9]   OPTICAL-TRANSITIONS IN STRAINED SI1-YCY LAYERS ON SI(001) [J].
KISSINGER, W ;
WEIDNER, M ;
OSTEN, HJ ;
EICHLER, M .
APPLIED PHYSICS LETTERS, 1994, 65 (26) :3356-3358
[10]   SYMMETRY ANALYSIS AND UNIAXIAL-STRESS EFFECT ON LOW-FIELD ELECTROREFLECTANCE OF SI FROM 3.0 TO 4.0 EV [J].
KONDO, K ;
MORITANI, A .
PHYSICAL REVIEW B, 1976, 14 (04) :1577-1592