AMPHOTERIC BEHAVIOR OF H0 IN GAAS

被引:55
作者
PAVESI, L [1 ]
GIANNOZZI, P [1 ]
REINHART, FK [1 ]
机构
[1] INST ROMAND RECH NUMER PHYS MAT,CH-1015 LAUSANNE,SWITZERLAND
来源
PHYSICAL REVIEW B | 1990年 / 42卷 / 03期
关键词
D O I
10.1103/PhysRevB.42.1864
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present the results of pseudopotential density-functional supercell calculations of the properties of neutral hydrogen in bulk GaAs. The equilibrium sites are determined, and the electronic properties for the equilibrium positions are studied. We find that the equilibrium site for unrelaxed GaAs:H is in the low-valence-charge-density region, whereas if the relaxation of the whole lattice is allowed, a shallow equilibrium minimum occurs at an antibonding site near an As ion. The diffusion path is in the high-valence-charge-density region around the As ions with a barrier as low as 0.1 eV. From our results, we suggest that H behaves as a deep acceptor in n-type GaAs and as a deep donor in p-type GaAs, and occupies different positions. Hence passivation of dopants occurs by neutralization. © 1990 The American Physical Society.
引用
收藏
页码:1864 / 1867
页数:4
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