SUPPRESSION OF FRINGE DIFFRACTION IN LOCALIZED HOLOGRAPHIC EXPOSURE FOR DFB LASER ARRAYS

被引：12

作者：

TALNEAU, A

CHANDOUINEAU, JP

CHARIL, J

OUGAZZADEN, A

机构：

[1] France Telecom/C.N.E.T. Lab. de Bagneux, Bagneux

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 1995年 / 7卷 / 07期

关键词：

D O I：

10.1109/68.393185

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A six-wavelength MQW DFB laser array emitting around 1.55 mu m realized in a single holographic lithography is described. Fringe-free localized grating insolation is attained using a mask with a novel aperture-edge design. The first-order grating periods as well as the ridge locations can be varied in a large span. The high throughput of holographic lithography is extended to multiwavelength DFB arrays.

引用

页码：721 / 723

页数：3

共 4 条

[1]

LEE TP, 1994, OEC 94

[2] 5-WAVELENGTH INTEGRATED DFB LASER ARRAYS WITH QUARTER-WAVE-SHIFTED STRUCTURES [J].