GROWTH HABITS OF ELECTRODEPOSITED NICKEL AND COBALT

被引:13
作者
CLIFFE, DR
FARR, JPG
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D O I
10.1149/1.2426112
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:299 / 306
页数:8
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共 17 条
[1]  
Antropov L.I., 1960, KINETICS ELECTRODE P
[2]  
BARKER G, 1958, MODERN ELECTROANALYT, P122
[3]  
BARNES SC, 1960, ELECTROCHEM ACTA, V2, P165
[4]  
Barrett C S, 1952, STRUCTURE METALS, V2rd
[5]   IMPROVED APPARATUS FOR FLOATING-ZONE MELTING BY ELECTRON BOMBARDMENT [J].
BIRBECK, FE ;
CALVERLEY, A .
JOURNAL OF SCIENTIFIC INSTRUMENTS, 1959, 36 (11) :460-463
[6]  
Brenner A., 1952, PLATING, V39, P865
[7]  
HOAR TP, 1962, T I METAL FINISH, V39, P166
[8]  
KAY D, 1961, TECHNIQUES ELECTRON
[9]   THE GROWTH OF ELECTRODEPOSITS [J].
KEEN, JM ;
FARR, JPG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (08) :668-678
[10]   Influence of hydrogen ion concentration on the crystal structure of electrodeposited cobalt [J].
Kersten, H. .
PHYSICS-A JOURNAL OF GENERAL AND APPLIED PHYSICS, 1932, 2 (01) :274-279