ON THE KINETIC-STUDY OF ELECTROCHEMICAL VAPOR-DEPOSITION

A theoretical analysis is presented which quantitatively describes the transition behaviour of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.